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About this Materials Science article

Tuning the electrical performance of Ge nanowire MOSFETs by focused ion beam implantation by Burchhart, T; Zeiner, C; Lugstein, A; Henkel, C; Bertagnolli, E is a Materials Science article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Materials Science.

Author
Burchhart, T; Zeiner, C; Lugstein, A; Henkel, C; Bertagnolli, E
Publisher
Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0957-4484)
Published
2010
Field
Materials Science (Physical Sciences)