About this scholarly article

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Thin absorber EUVL mask with light-shield border for full-field scanner: flatness and image placement change through mask process by Kamo, Takashi; Zurbrick, Larry S.; Montgomery, M. Warren; Tanaka, Yuusuke; Tanaka, Toshihiko; Suga, Osamu; Abe, Tsukasa; Takikawa, Tadahiko; Mohri, Hiroshi; Shoki, Tsutomu; Usui, Youichi is a scholarly article available to read on EtoBox.

Author

Kamo, Takashi; Zurbrick, Larry S.; Montgomery, M. Warren; Tanaka, Yuusuke; Tanaka, Toshihiko; Suga, Osamu; Abe, Tsukasa; Takikawa, Tadahiko; Mohri, Hiroshi; Shoki, Tsutomu; Usui, Youichi

Publisher

SPIE

Published

2009