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About this Engineering article
In and ex situ diagnostics of the growth of α-Ti thin films deposited by plasma-enhanced physical vapour deposition by H. Steffen; H. Wulff; A. Lunk is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- H. Steffen; H. Wulff; A. Lunk
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 1993
- Language
- EN
- Field
- Engineering (Physical Sciences)