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About this Materials Science article
Elucidating surface properties of dry-etched ZnO using H2/CH4 and H2/CH4/Ar plasma by Kuang-Po Hsueh is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Kuang-Po Hsueh
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0169-4332)
- Published
- 2010
- Language
- EN
- Field
- Materials Science (Physical Sciences)