About this scholarly article

SPIE Proceedings [SPIE San Dieg - DL Tentative - San Diego, CA (Sunday 1 July 1990)] X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography - Deposition- controlled uniformity of multilayer mirrors by Jankowski, Alan F.; Makowiecki, Daniel M.; McKernan, M. A.; Foreman, R. J.; Patterson, R. G.; Hoover, Richard B.; Walker II, Arthur B. C. is a scholarly article available to read on EtoBox.

Author

Jankowski, Alan F.; Makowiecki, Daniel M.; McKernan, M. A.; Foreman, R. J.; Patterson, R. G.; Hoover, Richard B.; Walker II, Arthur B. C.

Publisher

SPIE

Published

1991

Language

EN