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About this Engineering article
Reliability of 6-10 nm thermal SiO2films showing intrinsic dielectric integrity by Hokari, Y.; Baba, T.; Kawamura, N. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Hokari, Y.; Baba, T.; Kawamura, N.
- Publisher
- IEEE; Institute of Electrical and Electronics Engineers; Institute of Electrical and Electronics Engineers (IEEE) (ISSN 0018-9383)
- Published
- 1985
- Field
- Engineering (Physical Sciences)