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Growth responses of ultrathin CNx overcoats to process parameters by D.J. Li; Yip-Wah Chung is a Engineering article available to read on EtoBox.
What is Growth responses of ultrathin CNx overcoats to process parameters about?
Ultrathin CN x overcoats were grown using pulsed dc magnetron sputtering. Substrates were mounted on a holder that allowed 45tilt angle and rotation. Effects of process parameters on film growth were reviewed. AFM scans over large sampling areas show that thin CN x films obtained at À100 V substrate bias with 45-substrate tilt and 20 -25 rpm rotation have r.m.s. roughness about 0.2 -0.3 nm when sampled over 20 Â 20 Am 2 areas, increasing to ̈0.45 nm when sampled over ̈0.05 Â 3 cm 2 using X-ray reflectivity measurements. These 1 -2 nm thick ultrasmooth coatings reduced corrosion damage compared with coatings of the same thickness grown without substrate tilt and rotation. This improved performance is likely a result of more efficient and uniform momentum transfer parallel to the surface during deposition in this configuration. In addition, detailed X-ray reflectivity measurements showed that the mass density of these CN x films is ̈2.0 g/cm 3 , independent of film thickness from ̈1 to 10 nm, consistent with ion beam analysis.
Who reads Growth responses of ultrathin CNx overcoats to process parameters?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- D.J. Li; Yip-Wah Chung
- Publisher
- Elsevier Science; Elsevier ; Elsevier Sequoia; Elsevier BV (ISSN 0040-6090)
- Published
- 2006
- Language
- EN
- Field
- Engineering (Physical Sciences)