About this scholarly article

SPIE Proceedings [SPIE 16th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 18 September 1996)] 16th Annual BACUS Symposium on Photomask Technology and Management - Critical dimension photomask metrology tool requirements for 0.25 um and future microlithography by Schmidt, Michael R.; Tran, An; Shelden, Gilbert V.; Reynolds, James A. is a scholarly article available to read on EtoBox.

Author

Schmidt, Michael R.; Tran, An; Shelden, Gilbert V.; Reynolds, James A.

Publisher

SPIE

Published

1996