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About this Engineering article
Photoresponsivity enhancement in monolayer MoS 2 by rapid O 2 :Ar plasma treatment by Jadwiszczak, Jakub; Li, Gen; Cullen, Conor P.; Wang, Jing Jing; Maguire, Pierce; Duesberg, Georg S.; Lunney, James G.; Zhang, Hongzhou is a Engineering article available to read on EtoBox.
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- Author
- Jadwiszczak, Jakub; Li, Gen; Cullen, Conor P.; Wang, Jing Jing; Maguire, Pierce; Duesberg, Georg S.; Lunney, James G.; Zhang, Hongzhou
- Publisher
- American Institute of Physics; AIP Publishing (ISSN 0003-6951)
- Published
- 2019
- Language
- EN
- Field
- Engineering (Physical Sciences)