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About this Materials Science article
Photo-deprotection Patterning of Self-assembled Monolayers by Critchley, Kevin; Ducker, Robert; Bramble, Jonathan P.; Zhang, Lixin; Bushby, Richard J.; Leggett, Graham J.; Evans, Stephen D. is a Materials Science article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Critchley, Kevin; Ducker, Robert; Bramble, Jonathan P.; Zhang, Lixin; Bushby, Richard J.; Leggett, Graham J.; Evans, Stephen D.
- Publisher
- Taylor and Francis Group; Informa UK (Taylor & Francis); Taylor & Francis; Informa UK Limited (ISSN 1745-8080)
- Published
- 2007
- Language
- EN
- Field
- Materials Science (Physical Sciences)