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About this Engineering article
Theoretical Investigation on Silicon-Nitride Film Growth: Statistical Approach by Koseki, Shiro; Ishitani, Akihiko; Fujimura, Yuichi is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Koseki, Shiro; Ishitani, Akihiko; Fujimura, Yuichi
- Publisher
- Institute of Pure and Applied Physics; Japan Society of Applied Physics; IOP Publishing (ISSN 0021-4922)
- Published
- 1997
- Field
- Engineering (Physical Sciences)
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