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About this Physics and Astronomy article
Thickness-dependent strain relaxation in Si0.8Ge0.2Si(001) epitaxial films studied by spectroscopic ellipsometry by Jae Ho Bahng; Kwang Joo Kim; S.H. Ihm; J.Y. Kim is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Jae Ho Bahng; Kwang Joo Kim; S.H. Ihm; J.Y. Kim
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0038-1098)
- Published
- 1998
- Language
- EN
- Field
- Physics and Astronomy (Physical Sciences)
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