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Additive diffractive optical elements fabrication by PECVP deposition of SiO2 and lift-off process by Hadi Amata; Qiang Fu; Wolfgang Heidrich is a scholarly article available to read on EtoBox.

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Diffractive optical elements (DOEs) gradually start replacing traditional refractive optics in many applications. The growing interest in DOEs is mainly because of their flexibility in light manipulation with a small form factor and their ability to combine simultaneously optical and computational functions into a single part by applying the software-hardware co-design approach. Two main methods are widely used to fabricate DOEs. The first method is the etched-based method that combines photolithography and reactive-ion etching (RIE). The second method is additive fabrication, which combines metal deposition and nanoimprinting (NIL). Both methods have many drawbacks. The RIE methods suffer from issues like lags in the etched depth when the feature sizes differ in the same pattern (RIE lags), high surface roughness, and aspect ratio-dependent etching rate. The second method could produce high-resolution micro-optics. However, the technique could suffer from poor adhesion of the patterns with the substrate and poor uniformity across large areas. Here we propose a new way to fabricate multi-level DOEs by directly growing an optically transparent material on a glass substrate. The meth

Author

Hadi Amata; Qiang Fu; Wolfgang Heidrich

Publisher

SPIE

Published

2023

Language

EN