About this scholarly article

ECS Transactions - Deposition of TiN and TaN by Remote Plasma ALD for Diffusion Barrier Applications by Knoops, Harm; Baggetto, L.; Langereis, E.; Van de Sanden, M.C.M.; Klootwijk, J.H.; Roozeboom, F.; Niessen, R.A.H.; Notten, P.H.L.; Kessels, W.M.M. is a scholarly article available to read on EtoBox.

Author

Knoops, Harm; Baggetto, L.; Langereis, E.; Van de Sanden, M.C.M.; Klootwijk, J.H.; Roozeboom, F.; Niessen, R.A.H.; Notten, P.H.L.; Kessels, W.M.M.

Publisher

ECS

Published

2007