About this scholarly article

SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Alignment and overlay metrology issues for copper/low-K dual-damascene interconnect by Lai, Kafai; Nelson, Chris; Breen, Mark R.; Doros, Theodore G.; Holladay, Dan W.; Singh, Bhanwar is a scholarly article available to read on EtoBox.

Author

Lai, Kafai; Nelson, Chris; Breen, Mark R.; Doros, Theodore G.; Holladay, Dan W.; Singh, Bhanwar

Publisher

SPIE

Published

1999

Language

EN