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About this Physics and Astronomy article
Amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition at filament temperatures between 1500 and 1900 °C by Brogueira, P.; Conde, J. P.; Arekat, S.; Chu, V. is a Physics and Astronomy article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Physics and Astronomy.
- Author
- Brogueira, P.; Conde, J. P.; Arekat, S.; Chu, V.
- Publisher
- American Institute of Physics; AIP Publishing; Publons (ISSN 0021-8979)
- Published
- 1996
- Field
- Physics and Astronomy (Physical Sciences)
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