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Growth rate and morphology for ceramic films by pulsed-MOCVD by Susan Krumdieck; Rishi Raj is a Engineering article available to read on EtoBox.
What is Growth rate and morphology for ceramic films by pulsed-MOCVD about?
Titania films were deposited on nickel substrates from a dilute solution of titanium isopropoxide TTIP in toluene in order to study the growth rate and degree of microstructure control attainable with a metalorganic chemical vapor deposition system called pulsed-MOCVD. This novel system employs pulsed liquid injection with ultrasonic atomization to deliver the precursor to the low-pressure reactor. The film growth rate was studied as a function of temperature and precursor injection rate. An Arrhenius behavior was evident for susceptor temperatures below 500ЊC. At higher temperatures, the growth rate was nearly equal to the injection rate. Films 45 " 0.1-m thick were deposited at rates of up to 0.5" 0.008 mrmin. Two methods were employed for measurement of film growth rate, direct in situ observation of color-fringe evolution and calculation from final film thickness measurements using an optical microscope. The influence of deposition parameters on morphology was studied. The Ž . Ž . microstructure was characterized using optical and scanning electron microscopy SEM and X-ray diffraction XRD . At temperatures below 500ЊC the film was dense with small equiaxed crystals. At higher t
Who reads Growth rate and morphology for ceramic films by pulsed-MOCVD?
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Susan Krumdieck; Rishi Raj
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 2001
- Language
- EN
- Field
- Engineering (Physical Sciences)