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About this Engineering article
Thermal atomic layer etching: Mechanism, materials and prospects by Fang, Chang (author);Cao, Yanqiang (author);Wu, Di (author);Li, Aidong (author) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Fang, Chang (author);Cao, Yanqiang (author);Wu, Di (author);Li, Aidong (author)
- Publisher
- Elsevier B.V.
- Published
- 2018
- Language
- EN
- Field
- Engineering (Physical Sciences)