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About this Engineering article
Mechanical system construction for the EX-11 electron beam mask writer: A solution for 100 nm wafer lithography by K. Akeno; M. Ogasawara; T. Tojo is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- K. Akeno; M. Ogasawara; T. Tojo
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-211X)
- Published
- 2002
- Field
- Engineering (Physical Sciences)