About this scholarly article

SPIE Proceedings [SPIE Microelectronic Manufacturing '99 - Santa Clara, CA (Wednesday 22 September 1999)] In-Line Methods and Monitors for Process and Yield Improvement - Defect detection strategies for chemical-mechanical polishing process in shallow-trench isolation applications by Li, Jane J.; Liu, Albert H.; Hiemke, Scott S.; Ajuria, Sergio A.; Jakubczak, Jerome F. is a scholarly article available to read on EtoBox.

Author

Li, Jane J.; Liu, Albert H.; Hiemke, Scott S.; Ajuria, Sergio A.; Jakubczak, Jerome F.

Publisher

SPIE

Published

1999

Language

EN