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About this Engineering article
Low-Frequency Noise Assessment of Work Function Engineering Cap Layers in High-k Gate Stacks by Claeys, C.; Ritzenthaler, R.; Schram, T.; Arimura, H.; Horiguchi, N.; Simoen, E. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Claeys, C.; Ritzenthaler, R.; Schram, T.; Arimura, H.; Horiguchi, N.; Simoen, E.
- Publisher
- The Electrochemical Society; Electrochemical Society, Inc. (ISSN 2162-8769)
- Published
- 2019
- Language
- EN
- Field
- Engineering (Physical Sciences)
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