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About this Engineering article
Trench etching using a CBrF3 plasma and its study by optical emission spectroscopy by G Wöhl; A Weisheit; I Flohr; M Böttcher is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- G Wöhl; A Weisheit; I Flohr; M Böttcher
- Publisher
- Elsevier Science; Elsevier ; Elsevier Ltd.; Elsevier BV (ISSN 0042-207X)
- Published
- 1991
- Language
- EN
- Field
- Engineering (Physical Sciences)