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About this Engineering article
Hollow Electrode Enhanced Radio Frequency Glow Plasma and Its Application to the Chemical Vapor Deposition of Microcrystalline Silicon by Tabuchi, Toshihiro ;Mizukami, Hiroyuki ;Takashiri, Masayuki is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Tabuchi, Toshihiro ;Mizukami, Hiroyuki ;Takashiri, Masayuki
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics (ISSN 0734-2101)
- Published
- 2004
- Language
- EN
- Field
- Engineering (Physical Sciences)
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