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1997 International Semiconductor Conference 20th Edition. CAS '97 Proceedings - Contribution of gas phase reactions to the growth rate of LPCVD silicon films in the temperature range from 500 to 550°C by Cobianu, C.; Cosmin, P.; Modreanu, M.; Dascalu, D.; Holleman, J. is a scholarly article available to read on EtoBox.
- Author
- Cobianu, C.; Cosmin, P.; Modreanu, M.; Dascalu, D.; Holleman, J.
- Publisher
- IEEE
- Published
- 1997
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