About this document
TiN Microstructure Effects on Etching by come616 is a document available to read on EtoBox.
This document investigates the influence of TiN microstructure on its dry etch behavior, revealing that reducing the crystallinity of TiN makes it easier to etch. The study shows that TiN films deposited with higher bias power exhibit lower crystallinity and improved etch rates, particularly on sloped surfaces. Overall, the findings suggest a strategy for optimizing TiN deposition to enhance etching performance while maintaining other material properties.
- Author
- come616
- Language
- EN