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Preparation and characterization of MOCVD thin films of indium tin oxide by O.O Akinwunmi; M.A Eleruja; J.O Olowolafe; G.A Adegboyega; E.O.B Ajayi is a Materials Science article available to read on EtoBox.
What is Preparation and characterization of MOCVD thin films of indium tin oxide about?
Indium Tin Oxide (ITO) was deposited by pyrolysis of mixed metal acetylacetonate (a single solid-source precursor). This study demonstrates that the properties of the as-deposited ®lm depend on the deposition temperature. Films with a resistivity of 7X2 Â 10 À4 X cm, a visible transmission of over 80%, and a direct optical energy gap of 3.76 eV were deposited.
Who reads Preparation and characterization of MOCVD thin films of indium tin oxide?
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- O.O Akinwunmi; M.A Eleruja; J.O Olowolafe; G.A Adegboyega; E.O.B Ajayi
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0925-3467)
- Published
- 1999
- Language
- EN
- Field
- Materials Science (Physical Sciences)
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