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About this Engineering article

Ion Beam Etching of Silicon, Refractory Metals, and Refractory Metal Silicides Using a Chemistry Assisted Technique by Chinn, J. D. is a Engineering article available to read on EtoBox.

It is typically read by researchers, students, and practitioners in Engineering.

Author
Chinn, J. D.
Publisher
The Electrochemical Society; Electrochemical Society, Inc. (ISSN 0013-4651)
Published
1984
Language
EN
Field
Engineering (Physical Sciences)

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