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About this Engineering article
F2 Resist Based on Methacrylonitrile/2-Trifluoromethylacrylate Copolymers by Shirai, Masamitsu; Takashiba, Shinichi; Tsunooka, Masahiro is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Shirai, Masamitsu; Takashiba, Shinichi; Tsunooka, Masahiro
- Publisher
- Japan Science and Technology Information Aggregator, Electronic; The Technical Association of Photopolymers, Japan; Technical Association of Photopolymers; Technical Association of Photopolymers, Japan (ISSN 0914-9244)
- Published
- 2003
- Field
- Engineering (Physical Sciences)
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