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About this Engineering article
Ultrathin stacked Si3N4/SiO2gate dielectrics prepared by rapid thermal processing by Ting, W.; Ahn, J.H.; Kwong, D.L. is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Ting, W.; Ahn, J.H.; Kwong, D.L.
- Publisher
- The Institution of Electrical Engineers; Institution of Electrical Engineers; Institute of Electrical Engineers; Institution of Engineering and Technology (IET) (ISSN 0013-5194)
- Published
- 1991
- Field
- Engineering (Physical Sciences)