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About this Engineering article
Plasma-enhanced atomic layer deposition of Co using Co(MeCp)2 precursor by Park, Jusang; Lee, Han-Bo-Ram; Kim, Doyoung; Yoon, Jaehong; Lansalot, Clement; Gatineau, Julien; Chevrel, Henri; Kim, Hyungjun is a Engineering article available to read on EtoBox.
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- Author
- Park, Jusang; Lee, Han-Bo-Ram; Kim, Doyoung; Yoon, Jaehong; Lansalot, Clement; Gatineau, Julien; Chevrel, Henri; Kim, Hyungjun
- Publisher
- Elsevier ; Elsevier BV (ISSN 2095-4956)
- Published
- 2013
- Language
- EN
- Field
- Engineering (Physical Sciences)