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About this Engineering article
Study of shallow trench isolation technology with a poly-Si sidewall buffer layer by Juang, M H; Chen, C L; Jang, S L is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Juang, M H; Chen, C L; Jang, S L
- Publisher
- Institute of Physics; IOP Publishing; Institute of Physics Publishing (ISSN 0268-1242)
- Published
- 2007
- Field
- Engineering (Physical Sciences)