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About this scholarly article
2007 Non-Volatile Memory Technology Symposium - Alumina as a Hydrogen Barrier Layer for FeRAM Devices by Chowdhury, A.; Kim, J.; Wallace, R.M. is a scholarly article available to read on EtoBox.
- Author
- Chowdhury, A.; Kim, J.; Wallace, R.M.
- Publisher
- IEEE
- Published
- 2007