About this scholarly article

SPIE Proceedings [SPIE Photomask Japan 1995 - Kanagawa, Japan (Thursday 20 April 1995)] Photomask and X-Ray Mask Technology II - Mask-holding mechanism for an e-beam x-ray mask writer by Kunioka, Tatsuya; Shimazu, Nobuo; Shimizu, Akira; Sakai, Tomoaki; Kuriyama, Youichi; Yoshihara, Hideo is a scholarly article available to read on EtoBox.

Author

Kunioka, Tatsuya; Shimazu, Nobuo; Shimizu, Akira; Sakai, Tomoaki; Kuriyama, Youichi; Yoshihara, Hideo

Publisher

SPIE

Published

1995

Language

EN