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This document summarizes an experimental study on optimizing microchannel fabrication using direct UV laser writing photolithography. The researchers investigated how varying the laser intensity, stage speed, and photoresist thickness affected the width and depth of developed patterns. They used both liquid and dry film photoresists coated on substrates, which were patterned using a custom 405nm UV laser direct writing system. The geometry of developed patterns was analyzed using profilometry and imaging to
- Author
- SANGAM SRIKANTH
- Language
- EN