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16th IPRM. 2004 International Conference on Indium Phosphide and Related Materials, 2004. - Process optimization for dry etching of InP/InGaAsP-based photonic crystals with a Cl/sup 2//CH/sup 4//H/sup 2// mixture on an ICP-RIE by Strasser, P.; Wuest, R.; Robin, F.; Emi, D.; Jackel, H. is a scholarly article available to read on EtoBox.

Author
Strasser, P.; Wuest, R.; Robin, F.; Emi, D.; Jackel, H.
Publisher
IEEE
Published
2004

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