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Can I read Energy-Level Alignment Tuning at Tetracene/c-Si Interfaces on EtoBox?
Energy-Level Alignment Tuning at Tetracene/c-Si Interfaces by Jens Niederhausen; Rowan W. MacQueen; Engin Özkol; Clemens Gersmann; Moritz H. Futscher; Martin Liebhaber; Dennis Friedrich; Mario Borgwardt; Katherine A. Mazzio; Patrick Amsalem; Minh Hai Nguyen; Benjamin Daiber; Mathias Mews; Jörg Rappich; Florian Ruske; Rainer Eichberger; Bruno Ehrler; Klaus Lips is a Materials Science article available to read on EtoBox.
What is Energy-Level Alignment Tuning at Tetracene/c-Si Interfaces about?
The rational combination of tetracene (Tc) with crystalline silicon (c-Si) could greatly enhance c-Si solar cell efficiencies via singlet fission. The Tc/c-Si energy-level alignment (ELA) is thought to be central to controlling the required interface transfer processes. We modified hydrogen-terminated c-Si (H-Si) with 2,2′-(perfluoronaphthalene-2,6-diylidene)dimalononitrile (F6TCNNQ), C 60 , or NF 3 and probed the effect on the c-Si surface chemistry, the Tc/c-Si ELA, the Tc morphology, and solar cell characteristics using ultraviolet and X-ray photoelectron spectroscopy, atomic force microscopy, X-ray diffraction, photoluminescence transients, device measurements, and transfer matrixoptical modeling. Submonolayer interlayers of F6TCNNQ shifted the Tc/H-Si(111) ELA by up to 0.55 eV. C 60 showed no notable effect on the ELA and proved detrimental for the Tc film morphology and solar cell performance. Neither F6TCNNQ nor C 60 improved the Tc-related photocurrent significantly. NF 3 CVD substituted the H-termination of H-Si(100) with more electronegative species and resulted in work functions as high as 6 eV. This changed the Tc/H-Si(100) ELA by up to 0.45 eV. NF 3 plasma from a remot
Who reads Energy-Level Alignment Tuning at Tetracene/c-Si Interfaces?
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Jens Niederhausen; Rowan W. MacQueen; Engin Özkol; Clemens Gersmann; Moritz H. Futscher; Martin Liebhaber; Dennis Friedrich; Mario Borgwardt; Katherine A. Mazzio; Patrick Amsalem; Minh Hai Nguyen; Benjamin Daiber; Mathias Mews; Jörg Rappich; Florian Ruske; Rainer Eichberger; Bruno Ehrler; Klaus Lips
- Publisher
- American Chemical Society; American Chemical Society (ACS) (ISSN 1932-7447)
- Published
- 2020
- Language
- EN
- Field
- Materials Science (Physical Sciences)