About this scholarly article

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography by Kishikawa, Yasuhiro; Flagello, Donis G.; Kawashima, Miyoko; Ohkubo, Akinori; Iwasaki, Yuichi; Takeuchi, Seiji; Yoshii, Minoru; Honda, Tokuyuki is a scholarly article available to read on EtoBox.

Author

Kishikawa, Yasuhiro; Flagello, Donis G.; Kawashima, Miyoko; Ohkubo, Akinori; Iwasaki, Yuichi; Takeuchi, Seiji; Yoshii, Minoru; Honda, Tokuyuki

Publisher

SPIE

Published

2007