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ILGAR – A novel thin-film technology for sulfides by H.-J Muffler; Ch.-H Fischer; K Diesner; M.C Lux-Steiner is a Engineering article available to read on EtoBox.

What is ILGAR – A novel thin-film technology for sulfides about?

Ion layer gas reaction (ILGAR), a novel thin-"lm technology for sul"des is introduced. Its peculiarity is the low-temperature conversion of a solid metal salt precursor into a sul"de compound by reaction with gaseous H S. The capability of this technique is demonstrated by the preparation of CdS, which is either of cubic or hexagonal polycrystalline structure. Spectralphotometric measurements reveal a high optical band gap of 2.78 eV. A subsequent annealing process reduces this value to 2.45 eV. This fact as well as XRD results indicate a nanocrystalline structure of the ILGAR-deposited CdS thin "lms.

Who reads ILGAR – A novel thin-film technology for sulfides?

Author

H.-J Muffler; Ch.-H Fischer; K Diesner; M.C Lux-Steiner

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0927-0248)

Published

2001

Language

EN

Field

Engineering (Physical Sciences)