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Fenton oxidation and sequencing batch reactor (SBR) treatments of high-strength semiconductor wastewater by Sheng H. Lin; Chang D. Jiang is a Environmental Science article available to read on EtoBox.

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Treatment of a high-strength semiconductor wastewater was experimentally investigated in this study. The wastewater is characterized by a strong dark color, high chemical oxygen demand (COD) concentration, presence of refractory volatile organic compound and low biodegradability. Treatment of this wastewater by traditional activated sludge method is essentially impossible. In the present work, combined physical, chemical and biological methods were synergistically utilized to tackle the wastewater. The combined treatment consisted of air stripping, modified Fenton oxidation and sequencing batch reactor (SBR) method. Experimental tests were conducted to determine the effectiveness and the optimum operating conditions of the combined method. Test results clearly demonstrated the synergistic advantages of the combined treatments. The treatment train was capable of lowering the wastewater COD concentration from as high as 80,000 mg/l to below 100 mg/1 and completely eliminating the wastewater color. The overall water quality of the final effluent exceeded the direct discharge standard and better yet, this effluent can even be considered for reuse.

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Author

Sheng H. Lin; Chang D. Jiang

Publisher

Elsevier Science; Elsevier ; Elsevier BV (ISSN 0011-9164)

Published

2003

Language

EN

Field

Environmental Science (Physical Sciences)