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Can I read Magnetron sputtering growth of AlN film for photocatalytic CO2 reduction on EtoBox?
Magnetron sputtering growth of AlN film for photocatalytic CO2 reduction by Jintian Liu; Hui Zhang; Xinjian Xie; Huan Li; Xiang Zheng; Bowen Lu; Guifeng Chen is a Chemistry article available to read on EtoBox.
What is Magnetron sputtering growth of AlN film for photocatalytic CO2 reduction about?
Nitride has excellent optical properties and is a promising photocatalytic material. However, there are few studies on the effect of AlN on photocatalytic CO 2 reduction. In this work, AlN film was grown on Si (111) substrate by magnetron sputtering method and used for photocatalytic reduction of CO 2 . We successfully demonstrated the possibility of a photocatalytic system based on the AlN photochemical process. The system has no external energy input other than light. Here, the effects of different concentrations of NiO co-catalysts on the reduction products in the photocatalytic process were investigated. We found that when the ratio of NiO to organic solvent was 1:400, the production of H 2 and CO was the highest. The conversion of CO 2 to CO was increased from 6.674 to 16.67 μmol \* mol -1 , which is 2.49 times that of bare AlN photoanode. The photocurrent of NiO-modified AlN photoanodes are also significantly higher compared to bare AlN photoanode.
Who reads Magnetron sputtering growth of AlN film for photocatalytic CO2 reduction?
It is typically read by researchers, students, and practitioners in Chemistry.
- Author
- Jintian Liu; Hui Zhang; Xinjian Xie; Huan Li; Xiang Zheng; Bowen Lu; Guifeng Chen
- Publisher
- Springer Science and Business Media LLC
- Published
- 2022
- Language
- EN
- Field
- Chemistry (Physical Sciences)