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About this scholarly article
Overview of the impact of downscaling technology on 1∕f noise in p-MOSFETs to 90 nm by Valenza, M.; Hoffmann, A.; Sodini, D.; Laigle, A.; Martinez, F.; Rigaud, D. is a scholarly article available to read on EtoBox.
- Author
- Valenza, M.; Hoffmann, A.; Sodini, D.; Laigle, A.; Martinez, F.; Rigaud, D.
- Publisher
- The Institution of Electrical Engineers; Institution of Electrical Engineers; Institute of Electrical Engineers; Institution of Engineering and Technology (IET) (ISSN 1350-2409)
- Published
- 2004
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