About this scholarly article

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Use of programmed multilayer defects in validating a defect compensation strategy for EUV lithography by Ray-Chaudhuri, Avijit K.; Cardinale, Gregory F.; Fisher, Aaron; Mangat, Pawitter J. S.; Liang, Ted; Sweeney, Donald W.; Abboud, Frank E.; Grenon, Brian J. is a scholarly article available to read on EtoBox.

Author

Ray-Chaudhuri, Avijit K.; Cardinale, Gregory F.; Fisher, Aaron; Mangat, Pawitter J. S.; Liang, Ted; Sweeney, Donald W.; Abboud, Frank E.; Grenon, Brian J.

Publisher

SPIE

Published

1999

Language

EN