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Can I read Nanoscale-Thick CuPc/β-Ga~2~O~3~ p–n Junctions for Harsh-Environment-Resistant Self-Powered Deep-UV Photodetectors on EtoBox?
Nanoscale-Thick CuPc/β-Ga~2~O~3~ p–n Junctions for Harsh-Environment-Resistant Self-Powered Deep-UV Photodetectors by Tianli Zhao; Huaile He; Chao Wu; Li Lai; Yanxiu Ma; Hu Yang; Haizheng Hu; Aiping Liu; Daoyou Guo; Shunli Wang is a Materials Science article available to read on EtoBox.
What is Nanoscale-Thick CuPc/β-Ga~2~O~3~ p–n Junctions for Harsh-Environment-Resistant Self-Powered Deep-UV Photodetectors about?
Due to their crucial role in ultraviolet communication and monitoring, deep-ultraviolet (DUV) photodetectors have garnered much interest. Recently, Ga 2 O 3 has emerged as the best material for DUV photodetectors because of its ultrawide bandgap (4.5-4.9 eV), excellent UV photon absorption coefficient, high structural stability, and affordability. However, there are several difficulties in realizing high-performance Ga 2 O 3based DUV photodetectors with a high tolerance for harsh environments. In this work, nanoscale-thick CuPc/β-Ga 2 O 3 p-n junctions were used to build high-performance DUV photodetectors by a straightforward solution-processing approach. The p-n junction photodetectors exhibit improved photoelectric performance compared to a single device made of β-Ga 2 O 3 or CuPc, with a photo-todark current ratio of 3700 and a fast response time of ∼20 ms under a bias of 0 V. Due to the excellent stability of the nanoscalethick CuPc film, the device can maintain a high photocurrent even at high temperatures or under long-term DUV irradiation. Our work provides an effective strategy toward highly harsh-environment-resistant DUV photodetectors.
Who reads Nanoscale-Thick CuPc/β-Ga~2~O~3~ p–n Junctions for Harsh-Environment-Resistant Self-Powered Deep-UV Photodetectors?
It is typically read by researchers, students, and practitioners in Materials Science.
- Author
- Tianli Zhao; Huaile He; Chao Wu; Li Lai; Yanxiu Ma; Hu Yang; Haizheng Hu; Aiping Liu; Daoyou Guo; Shunli Wang
- Publisher
- American Chemical Society (ACS)
- Published
- 2023
- Language
- EN
- Field
- Materials Science (Physical Sciences)