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About this Engineering article
Barrier property of TiSiN films formed by low frequency, high density inductively coupled plasma process by Y.C. Ee; Z. Chen; W.D. Wang; D.Z. Chi; S. Xu; S.B. Law is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Y.C. Ee; Z. Chen; W.D. Wang; D.Z. Chi; S. Xu; S.B. Law
- Publisher
- Elsevier Science; Elsevier ; Elsevier BV (ISSN 0257-8972)
- Published
- 2005
- Language
- EN
- Field
- Engineering (Physical Sciences)
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