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ACS SYMPOSIUM SERIES 614 MICROELECTRONICS TECHNOLOGY:POLYMERS FOR ADVANCED IMAGING AND PACKAGING by ELSA REICHMANIS; CHRISTOPHER K. OBER; SCOTT A. MACDONALD; TAKAO IWAYANAGI; TADATOMI NISHIKUBO; O. Nalamasu; A. G. Timko; F. M. Houlihan; Anthony E. Novembre; R. Tarascon; N. Münzel; S. G. Slater; Hiroshi Ito; Greg Breyta; Donald C. Hofer; R. Sooriyakumaran; C. Mertesdorf; P. Falcigno; H. J. Kirner; B. Nathal; H. T. Schacht; R. Schulz; A. Zettler; C. A. Mack; Jiro Nakamura; Hiroshi Ban; Akinobu Tanaka; E. Chin; J. M. Kometani; R. Harley; James W. Thackeray; Mark D. Denison; Theodore H. Fedynyshyn; Doris Kang; Roger Sinta; Toshio Sakamizu; Hiroshi Shiraishi; Takumi Ueno; J. E. Hanson; K. H. Jensen; N. Gargiulo; D. Motta; D. A. Pingor; David A. Mixon; C. Knurek; Alexander M. Vekselman; Chunhao Zhang; Graham D. Darling; Sharon A. Heffner; Mary E. Galvin; Linda Gerena; Peter A. Mirau; Thomas X. Neenan; E. A. Chandross; F. M Houlihan; Ying Jiang; John Maher; David Bassett; Tohru Ushirogouchi; Takuya Naito; Koji Asakawa; Naomi Shida; Makoto Nakase; Tsukasa Tada; Robert D. Allen; I- Y. Wan; Gregory M. Wallraff; Richard A. DiPietro; Roderick R. Kunz; Susan C. Pa is a book available to read on EtoBox.
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This volume provides an up-to-date assessment of chemically-amplified resist materials chemistry and process considerations. It reports novel chemistry for single-layer 193nm lithographic applications, and discusses new approaches to silicon-containing resists and multi-level processes.
- Author
- ELSA REICHMANIS; CHRISTOPHER K. OBER; SCOTT A. MACDONALD; TAKAO IWAYANAGI; TADATOMI NISHIKUBO; O. Nalamasu; A. G. Timko; F. M. Houlihan; Anthony E. Novembre; R. Tarascon; N. Münzel; S. G. Slater; Hiroshi Ito; Greg Breyta; Donald C. Hofer; R. Sooriyakumaran; C. Mertesdorf; P. Falcigno; H. J. Kirner; B. Nathal; H. T. Schacht; R. Schulz; A. Zettler; C. A. Mack; Jiro Nakamura; Hiroshi Ban; Akinobu Tanaka; E. Chin; J. M. Kometani; R. Harley; James W. Thackeray; Mark D. Denison; Theodore H. Fedynyshyn; Doris Kang; Roger Sinta; Toshio Sakamizu; Hiroshi Shiraishi; Takumi Ueno; J. E. Hanson; K. H. Jensen; N. Gargiulo; D. Motta; D. A. Pingor; David A. Mixon; C. Knurek; Alexander M. Vekselman; Chunhao Zhang; Graham D. Darling; Sharon A. Heffner; Mary E. Galvin; Linda Gerena; Peter A. Mirau; Thomas X. Neenan; E. A. Chandross; F. M Houlihan; Ying Jiang; John Maher; David Bassett; Tohru Ushirogouchi; Takuya Naito; Koji Asakawa; Naomi Shida; Makoto Nakase; Tsukasa Tada; Robert D. Allen; I- Y. Wan; Gregory M. Wallraff; Richard A. DiPietro; Roderick R. Kunz; Susan C. Pa
- Publisher
- AMERICAN CHEMICAL SOCIETY,WASHINGTON,DC 1995
- Published
- 1995
- Language
- EN
- ISBN
- 9780841215504
- Subjects
- Science, Technology, Chemistry
Other editions & translations
More by ELSA REICHMANIS; CHRISTOPHER K. OBER; SCOTT A. MACDONALD; TAKAO IWAYANAGI; TADATOMI NISHIKUBO; O. Nalamasu; A. G. Timko; F. M. Houlihan; Anthony E. Novembre; R. Tarascon; N. Münzel; S. G. Slater; Hiroshi Ito; Greg Breyta; Donald C. Hofer; R. Sooriyakumaran; C. Mertesdorf; P. Falcigno; H. J. Kirner; B. Nathal; H. T. Schacht; R. Schulz; A. Zettler; C. A. Mack; Jiro Nakamura; Hiroshi Ban; Akinobu Tanaka; E. Chin; J. M. Kometani; R. Harley; James W. Thackeray; Mark D. Denison; Theodore H. Fedynyshyn; Doris Kang; Roger Sinta; Toshio Sakamizu; Hiroshi Shiraishi; Takumi Ueno; J. E. Hanson; K. H. Jensen; N. Gargiulo; D. Motta; D. A. Pingor; David A. Mixon; C. Knurek; Alexander M. Vekselman; Chunhao Zhang; Graham D. Darling; Sharon A. Heffner; Mary E. Galvin; Linda Gerena; Peter A. Mirau; Thomas X. Neenan; E. A. Chandross; F. M Houlihan; Ying Jiang; John Maher; David Bassett; Tohru Ushirogouchi; Takuya Naito; Koji Asakawa; Naomi Shida; Makoto Nakase; Tsukasa Tada; Robert D. Allen; I- Y. Wan; Gregory M. Wallraff; Richard A. DiPietro; Roderick R. Kunz; Susan C. Pa
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