About this scholarly article

2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference - Minimum power fail in high density structure improved by Chemical and Mechanical Polishing optimization by Denis, L.; Dureuil, V.; Fournier, C.; Richou, G.; Nogueira, F.; Petit, D.; Bostelmann, M.; Comas, M.; Dorval, D.; Deconinck, P.; Delahaye, B. is a scholarly article available to read on EtoBox.

Author

Denis, L.; Dureuil, V.; Fournier, C.; Richou, G.; Nogueira, F.; Petit, D.; Bostelmann, M.; Comas, M.; Dorval, D.; Deconinck, P.; Delahaye, B.

Publisher

IEEE

Published

2009

Language

EN