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About this Engineering article
Combined Helium Ion Beam and Nanoimprint Lithography Attains 4 Nm Half-pitch Dense Patterns by Li, Wen-Di; Wu, Wei; Stanley Williams, Richard is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Li, Wen-Di; Wu, Wei; Stanley Williams, Richard
- Publisher
- AVS (American Vacuum Society); American Vacuum Society; American Institute of Physics; AVS Science and Technology Society (ISSN 1520-8567)
- Published
- 2012
- Language
- EN
- Field
- Engineering (Physical Sciences)
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