About this scholarly article

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Optical Microlithography XVII - A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27 by Majoni, Stefan; Smith, Bruce W.; Driessen, Frank A.; Kasprowicz, Bryan S.; Harris, Paul D. is a scholarly article available to read on EtoBox.

Author

Majoni, Stefan; Smith, Bruce W.; Driessen, Frank A.; Kasprowicz, Bryan S.; Harris, Paul D.

Publisher

SPIE

Published

2004