About this scholarly article

SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Primary evaluation of proximity and resist heating effects observed in high-acceleration voltage e-beam writing for 180-nm-and-beyond rule reticle fabrication by Kuwahara, Naoko; Nakagawa, H.; Kurihara, Masa-aki; Hayashi, Naoya; Sano, Hisatake; Maruta, E.; Takikawa, T.; Noguchi, Shigeru; Morimoto, Hiroaki is a scholarly article available to read on EtoBox.

Author

Kuwahara, Naoko; Nakagawa, H.; Kurihara, Masa-aki; Hayashi, Naoya; Sano, Hisatake; Maruta, E.; Takikawa, T.; Noguchi, Shigeru; Morimoto, Hiroaki

Publisher

SPIE

Published

1999

Language

EN