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About this Engineering article
Ultrathin Ru–Ta–C Barriers for Cu Metallization by Fang, J. S. (author);Lin, J. H. (author);Chen, B. Y. (author);Chin, T. S. (author) is a Engineering article available to read on EtoBox.
It is typically read by researchers, students, and practitioners in Engineering.
- Author
- Fang, J. S. (author);Lin, J. H. (author);Chen, B. Y. (author);Chin, T. S. (author)
- Publisher
- The Electrochemical Society
- Published
- 2011
- Language
- EN
- Field
- Engineering (Physical Sciences)